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Keramyske Sputtering Doelen

Keramyske Sputtering Doelen

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Silicon Nitride (Si3N4) Sputtering Doelen


Hege suverens 3N5 (99.95%) silisium nitride keramyske doel, De priis is allinich foar referinsje, nim dan kontakt op mei de klanttsjinst foar offerte.

Elemint:Si₃N₄
Reinigens:3N 4N
Foarm:Planar doel
MOQ:1PC
Pakket:Trije-laach fakuüm ferpakking of argongas beskerming, yn oerienstimming mei IATA, DOT packaging spesifikaasje.

Oersicht

Physical and chemical properties

It silisiumnitride keramyske doel is in griis bêst materiaal makke troch drukken en sinterjen, mei in smeltpunt fan 1900 ° C en in tichtheid fan 3.20g / cm³. Silisiumnitride wurdt brûkt as etsmasker yn mikrofabryk en as isolator en gemyske barriêre yn yntegreare circuits. Oare gebrûk omfetsje lagers yn in protte ferskillende tapassingen, en materialen mei hege temperatueren lykas raketmotoren.

Silicon nitride keramyske doel-relatearre parameters

wy leverje silisiumnitride sputterdoelen mei suverens fan 99.5% en 99.9%. Har diameters fariearje fan 1 inch oant 8 inch, rûn, 0.125 inch dik en 0.25 inch dik.

Related Ceramic Sputtering Materialen

Oxide Sputtering Doelen
Aluminium okside (Al2O3)Izertetroxide (Fe3O4)Lanthanum Nickelate (LaNiO3)Scandium Oxide (Sc2O3)Aluminium sink okside (AZO)
Fluor Tin Oxide (FTO)Lanthanum Ferrite (LaFeO3)Strontium Titanate (SrTiO3)Antimony Tin Oxide (ATO)Gallium okside (Ga2O3)
Lanthanum Manganate (LaMnO3)Strontium Ruthenate (SrRuO3)Bismuth Oxide (Bi2O3)Gallium sinkokside (GZO)Magnesiumoxide (MgO)
Strontium Manganate (SrMnO3)Bismut Titanate (BiTiO3)Gadolinium okside (Gd2O3)Molybdenum okside (MoO3)Titanium dioxide (TiO2)
Barium Titanate (BaTiO3)Hafniumdioxide (HfO2)Niobium okside (Nb2Ox)Titanium pentoxide (Ti3O5)Cerium okside (CeO2)
Holmium okside (Ho2O3)Nikkelokside (NiO)Tantaal okside (Ta2O5)Chromium okside (Cr2O3)Indium okside (In2O3)
Neodymium okside (Nd2O3)Terbium okside (Tb4O7)Cobalt Oxide (CoO)Indium Tin Oxide (ITO)Lead Oxide (PbO)
Thulium okside (Tm2O3)Koperokside (CuO)Indium sinkokside (IZO)Sink Tin Oxide (ZTO)Vanadium Dioxide (VO2)
Cuprous okside (Cu2O)Indium Gallium Sink Oxide (IGZO)Praseodymium okside (Pr6O11)Vanadiumtrioxide (V2O3)Erbium okside (Er2O3)
Lanthanum okside (La2O3)Silisiummonokside (SiO)Vanadium pentoxide (V2O5)Europium okside (Eu2O3)Lanthanum Strontium Cobalt Oxide (LSCO)
Silisiumdiokside (SiO2)Wolfram trioxide (WO3)Izertrioxide (Fe2O3)Lanthaanaluminaat (LaAl2O3)Samarium okside (Sm2O3)
Yttrium okside (Y2O3)Yttrium Zirconium Oxide (YSZ)Yttrium Barium Koper Oxide (YBCO)Sinkokside (ZnO)Zirkoniumokside (ZrO2)
Fluoride Sputtering Doelen
Aluminiumfluoride (AlF3)Dysprosium Fluoride (DyF3)Neodymiumfluoride (NdF3)Praseodymiumfluoride (PrF3)Yttrium Fluoride(YF3)
Bariumfluoride (BaF2)Lithiumfluoride (LiF)Natriumfluoride (NaF)Strontiumfluoride (SrF3)Sinkfluoride (ZnF3)
Calcium Fluoride (CaF2)Lanthanum Fluoride (LaF3)Natriumaluminiumfluoride (Na2AlF6)Samariumfluoride (SmF3)Ytterbium Fluoride (YbF3)
Ceriumfluoride (CeF3)Magnesiumfluoride (MgF2)Kaliumfluoride (KF)
Nitride Sputtering Doelen
Aluminium Nitride (AlN)Hafnium Nitride (HfN)Silisiumnitrid (Si3N4)Titanium Nitride (TiN)Zirkoniumnitrid (ZrN)
Boron Nitride (BN)Niobium Nitride (NbN)Tantalum Nitride (TaN)Vanadium Nitride (VN)
Carbide Sputtering Targets
Boron Carbide (B4C)Niobiumkarbid (NbC)Tantaalkarbid (TaC)Wolframkarbid (WC)Zirkoniumkarbid (ZrC)
Hafniumkarbid (HfC)Nikkelkarbid (NiC)Titaniumkarbid (TiC)Tungsten Carbide Cobalt (WC+Co)Vanadiumkarbid (VC)
Molybdeenkarbid (MoC)Silisiumkarbid (SiC)Titanium Carbonitrid (TiCN)
Boride Sputtering Doelen
Chromiumdiboride (CrB2)Iron Boride (FeB)Tantalum Boride (TaB)Titanium Diboride (TiB2)Hafnium Diboride (HfB2)
Lanthanum Hexaboride (LaB6)Zirkoniumdiboride (ZrB2)
Sulfide Sputtering Doelen
Cadmium Sulfide (CdS)Iron Sulfide (FeS)Mangaansulfide (MnS)Tantaal Sulfide (TaS)Magnesium Sulfide (MgS)
Kopersulfide (CuS)Lead Sulfide (PbS)Niobium Sulfide (NbS)Wolfram Sulfide (WS2)Antimoansulfide (Sb2S3)
Cerium Sulfide (Ce2S3)Molybdeen Sulfide (MoS2)Yndium Sulfide (In2S3)Sinksulfide (ZnS)
Silicide Sputtering Doelen
Chromium silicide (CrSi)Magnesium silicide (MgSi)Tantaal silicide (TaSi2)Wolfram silicide (WSi2)Zirkonium silicide (ZrSi2)
Molybdenum silicide (MoSi2)Nikkel Silicide (NiSi)Titanium silicide (TiSi2)Vanadium silicide (VSi)
Selenide Sputtering Doelen
Bismut Selenide (Bi2Se3)Chromium Selenide (CrSe)Molybdenum Selenide (MoSe2)Gallium Selenide (Ga2Se3)Wolfram Selenide (WSe2)
Koper Selenide (Cu2Se)Lead Selenide (PbSe)Indium Selenide (In2Se3)Germanium Selenide (GeSe2)Tin Selenide (SnSe)
Cadmium Selenide (CdSe)Antimoan Selenide (Sb2Se3)
Telluride Sputtering Doelen
Cadmium Telluride (CdTe)Lead Telluride (PbTe)Germanium Telluride (GeTe)Germanium Antimony Telluride (GST)Bismuth Telluride (Bi2Te3)
Antimoan tritelluride (Sb2Te3)Antimoan tritelluride (Sb7Te3)
Antimonide Sputtering Doelen
Aluminium Antimonide (AlSb)Indium Antimonide (InSb)Gallium Antimonide (GaSb)Sink Antimonide (ZnSb)Aluminium Gallium Antimonide (AlGaSb)
Compound Sputtering Targets Foar Ferroelectric / Lithium Batterijen
Lithium Cobalt Oxide LiCoO2Lithium Mangaan Nikkel Oxide LiNi0.5Mn1.5O3Lithium Iron Fosfaat LiFePO4Lithium-Rich Lithium Kobalt OxideLi(1+X)CoO2Lithium-ryk lithium manganateLi(1+X)Mn2O4
Lithium TitanateLi4Ti5O12Aluminium Doped Lithium Cobalt Oxide AlLiCoO2Aluminium Doped Lithium Manganate LiMn2O4 + AlxLithium Titanium FosfaatLiTi2(PO4)3Lithium Manganate LiMn2O4
Lithiumfosfaat Li3PO4Lithium Silisium Fosfaat LiSiPO4Barium TitanateBaTiO3Strontium TitanateSrTiO3Bismut TitanateBiTiO3
Lanthanum Strontium Cobalt Oxide LSCOLanthanum Calcium Mangaan Oxide LCMOLithium Cobalt Oxide LiCo2O4Lead Zirconate TitanatePZTBoronoxide Doped Lithium Fosfaat Li3PO4: B2O3
Lithium Lanthaan Titanate Li0.35La0.57TiO3Lanthanum Zirconium Lithium Oxide LLZOLanthanum Strontium Manganese Oxide LSMOBismuth FerriteBiFeO3Barium Strontium Titanate BaSrTiO3


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